A Python-based tool for modeling optical photolithography
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Updated
Jan 29, 2025 - Python
A Python-based tool for modeling optical photolithography
Maskless photolithography system targeting 5um resolution. Open hardware design.
Desktop app for lithography learning available for Windows, macOS, and Linux
Lithography simulator
repo for the website of neural litho project
PolyHatch is an AutoCAD script written in lisp language to automate a basic photolithography photomask verification. The purpose of this scrip is to look for closed polylines within a given selection of drawings in a list of layers and hatch them.
Basic parameteric shapes to facilitate mask design in CleWin
High performance jax-based photolithography simulation.
Optical Proximity Correction (OPC) is a photolithography technique that modifies photomask geometry to counteract diffraction and process effects, ensuring accurate printing of patterns on the wafer. This work demonstrates a proof of concept showing how using a GPU-based approach can significantly speed up these modifications compared to a CPU.
Photolithographic mask visualization and automatic microelectrode array design
A plugin for KLayout that generates a machine-readable barcode for GCA optical steppers.
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